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Kims Reference 標準片(Reference Material)
Thickness measurement
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Nano Thickness Calibrator KRC-NTC-HfO2
KRC-NTC-HfO2
Nominal thickness: 5 nm, 10 nm, 15 nm, 20 nm
Substrate: SiO2(2 nm) / Si(100) wafer
Film deposition: Atomic Layer Deposition
Certification method: Mutual calibration with TEM and MEIS
Traceability: Silicon lattice constant measured by TEM
Multiple Layer Film KRC-MLC
KRC-MLF-100
Nominal thickness: 10 nm, 20 nm, 50 nm
Material: Si/Ge multiple layers
Substrate: Si(100)
Specimen size: 10 mm x 10 mm x 0.65 mm
Traceability: STEM/EDS line profile, HR-TEM image
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