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Kims Reference 標準片(Reference Material)
Characterization of instrument
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CRM for the characterization of AFM tip KRC-ATC-200
KRC-ATC-200P [CC-X]
Trench width: 50 nm, 100 nm, 200 nm
Pattern width: 50 nm (not certified)
Trench Height: 100 nm (not certified)
Pattern length:4.0 mm (certified area: 3.0 mm from center)
CRM for the Checking of Tip Shape KRC-TSC-200
KRC-TSC-200
Pattern width: 180 nm
Trench width: 400 nm
Pattern height: 1,000 nm (not certified)
Pattern length: 4.0 mm (certified area: 3.0 mm from center)
CRM for the characterization of SSCM KRC-SSRM-100
KRC-SSRM-100
Activated layer width: 5 nm, 10 nm, 15 nm, 20 nm, 40 nm
Pattern length: 4.0 mm (certified area: 3.0 mm from enter)
Roughness (Rq): max 0.5 nm
Defectivity: max 2% (max 60 um within 3,000 μm certified area)
Traceability: Si lattice constant measured by TEM
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